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1

Specific features of intensification of silicon etching in CF4/O2plasma

Yu. N. Grigoryev, A. G. Gorobchuk

Journal:

Russian Microelectronics

Year:

2007

Language:

english

File:

PDF, 253 KB

english, 2007

2

Effect of HF discharge structure on etch nonuniformity in plasma-chemical reactor

Grigor’ev, Yu. N., Gorobchuk, A. G.

Journal:

Russian Microelectronics

Year:

2014

Language:

english

File:

PDF, 368 KB

english, 2014

3

[IEEE 2004 24th International Conference on Microelectronics - Nis, Serbia (16-19 May 2004)] 2004 24th International Conference on Microelectronics (IEEE Cat. No.04TH8716) - Numerical modeling of silicon etching in CF/sub 4//O/sub 2/ plasma-chemical system

Grigoryev, Yu.N., Gorobchuk, A.G.

Year:

2004

Language:

english

File:

PDF, 317 KB

english, 2004

4

[IEEE 1997 21st International Conference on Microelectronics. Proceedings - Nis, Yugoslavia (14-17 Sept. 1997)] 1997 21st International Conference on Microelectronics. Proceedings - Numerical simulation of plasma-chemical etching reactors

Grigoryev, Yu.N., Gorobchuk, A.G.

Year:

1997

Language:

english

File:

PDF, 448 KB

english, 1997

5

[IEEE 2006 25th International Conference on Microelectronics - Belgrade, Serbia and Montenegro (14-17 May 2006)] 2006 25th International Conference on Microelectronics - Numerical Investigation of O2 Adsorption Effect in Si - CF4/O2 System

Grigoryev, Yu.N., Gorobchuk, A.G.

Year:

2006

Language:

english

File:

PDF, 177 KB

english, 2006

6

[IEEE 2008 26th International Conference on Microelectronics (MIEL 2008) - Nis, Serbia and Montenegro (2008.05.11-2008.05.14)] 2008 26th International Conference on Microelectronics - Effect of O2 admixture: Competition of electron density and etching rate in CF4/O2 plasma-etching process

Grigoryev, Yu. N., Gorobchuk, A. G.

Year:

2008

Language:

english

File:

PDF, 183 KB

english, 2008

7

[IEEE 2010 27th International Conference on Microelectronics Proceedings - Nis, Serbia (2010.05.16-2010.05.19)] 2010 27th International Conference on Microelectronics Proceedings - Effect of RF discharge structure on silicon etching in CF4/O2

Grigoryev, Yu. N., Gorobchuk, A. G.

Year:

2010

Language:

english

File:

PDF, 203 KB

english, 2010

8

[IEEE 2013 International Siberian Conference on Control and Communications (SIBCON 2013) - Krasnoyarsk, Russia (2013.09.12-2013.09.13)] 2013 International Siberian Conference on Control and Communications (SIBCON) - Numerical modeling of two RF discharge structure in plasma-chemical etching reactor

Grigoryev, Yurii N., Gorobchuk, Aleksey G.

Year:

2013

Language:

english

File:

PDF, 399 KB

english, 2013

9

[IEEE 2008 IEEE Region 8 International Conference on Computational Technologies in Electrical and Electronics Engineering (SIBIRCON) - Novosibirsk, Russia (2008.07.21-2008.07.25)] 2008 IEEE Region 8 International Conference on Computational Technologies in Electrical and Electronics Engineering - Effect of electron density in RF-discharge on etching rate in plasma-chemical reactor

Yurii Grigoryev,, Aleksey Gorobchuk,

Year:

2008

Language:

english

File:

PDF, 398 KB

english, 2008

10

[IEEE 2010 IEEE Region 8 International Conference on "Computational Technologies in Electrical and Electronics Engineering" (SIBIRCON 2010) - Irkutsk, Russia (2010.07.11-2010.07.15)] 2010 IEEE Region 8 International Conference on Computational Technologies in Electrical and Electronics Engineering (SIBIRCON) - Effect of RF discharge structure on etching rate in plasma-chemical reactor

Grigoryev, Yurii, Gorobchuk, Aleksey

Year:

2010

Language:

english

File:

PDF, 193 KB

english, 2010

11

Simulation of the polymerization process on a silicon surface under plasma-chemical etching in CF4/H2

Grigoryev, Yu. N., Gorobchuk, A. G.

Journal:

Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques

Year:

2015

Language:

english

File:

PDF, 240 KB

english, 2015

12

[IEEE 2015 International Siberian Conference on Control and Communications (SIBCON) - Omsk, Russia (2015.5.21-2015.5.23)] 2015 International Siberian Conference on Control and Communications (SIBCON) - Numerical modeling of silicon processing technology in CF4/H2 plasma

Gorobchuk, Aleksey

Year:

2015

Language:

english

File:

PDF, 104 KB

english, 2015

13

[IEEE 2000 22nd International Conference on Microelectronics. Proceedings - Nis, Yugoslavia (14-17 May 2000)] 2000 22nd International Conference on Microelectronics. Proceedings (Cat. No.00TH8400) - Peculiarities of Si films etching in CF/sub 4/ parent gas

Grigoryev, Yu.N., Gorobchuk, A.G.

Year:

1999

Language:

english

File:

PDF, 466 KB

english, 1999